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Mask Aligner
프로윈의 Mask Aligner는 감광액(PR: Photo Resist)이 도포된 반도체용 웨이퍼나 유리기판위에 회로가 그려진 포토 마스크를 올려놓고 UV를 조사함으로써 미세 패턴을 얻을 수 있는 Optical Lithography 장비입니다. 정밀 얼라인먼트가 가능하여 터치스크린 패널, 평판 디스플레이, MEMS/Bio-MEMS, LED 등의 정밀정렬 및 Patterning에 응용 가능합니다.
M-100
Equipment | M-100 |
---|---|
Type | PLC Control Manual system |
Mask Size | up to 5”×5” |
Substrate Size | Piece to 4” |
Resolution | 1㎛ |
Alignment Accuracy | 1㎛ |
Lamp & Power supply | 350W |
Wave Length | 350~450nm |
UV Intensity | 15~25㎽/㎠ |
UV Beam Uniformity | 3% |
Contact Mode | Vacuum / Hard / Soft / Proximity |
Microscope | Dual CCD Zoom Microscope |
Option | Anti-vibration table IR BSA CCD BSA |
M-150
Equipment | M-150 |
---|---|
Type | PLC Control Manual system |
Mask Size | up to 7”×7” |
Substrate Size | Piece to 6” |
Resolution | 1㎛ |
Alignment Accuracy | 1㎛ |
Lamp & Power supply | 350W |
Wave Length | 350~450nm |
UV Intensity | 15~25㎽/㎠ |
UV Beam Uniformity | 3% |
Contact Mode | Vacuum / Hard / Soft / Proximity |
Microscope | Dual CCD Zoom Microscope |
Option | Anti-vibration table IR BSA CCD BSA |
S-150
Equipment | S-150 |
---|---|
Mask Size | 7” |
Substrate Size | 6” |
Substrate chuck moving mode | Manual/ (Z,θ motorized) |
Lamp power | 1kw |
Beam uniformity | 3~5% |
UV Intensity | 365nm~450nm / 365nm : 20mw/㎠ |
Resolution | 1um |
Alignment accuracy | 1um |
Operation | Manual / semi-auto |
Contact mode | soft, hard, vacuum, proximity |
Control type | Manual, touch, joystick |
P-150
Equipment | P-150 |
---|---|
Type | Touch PC Control Manual system |
Mask Size | up to 7”×7” |
Substrate Size | Piece to 6” |
Resolution | 1㎛ |
Alignment Accuracy | 1㎛ |
Lamp & Power supply | 350W |
Wave Length | 350~450nm |
UV Intensity | 15~25㎽/㎠ |
UV Beam Uniformity | 3% |
Contact Mode | Vacuum / Hard / Soft / Proximity |
Microscope | Dual CCD Zoom Microscope |
Option | Anti-vibration table IR BSA CCD BSA |
S-200
Equipment | S-200 |
---|---|
Type | Touch PC Control & Joystick Semi-auto system |
Mask Size | up to 7”×7”~14”×14” |
Substrate Size | Piece to 6”~12’ |
Stage | X, Y, X, θ Motorize control |
Lamp & Power supply | 350W ~ 2000W |
Wave Length | 350~450nm |
UV Intensity | 15~25㎽/㎠ |
UV Beam Uniformity | 3~5% |
Resolution | 1um |
Alignment accuracy | 1um |
Contact Mode | Vacuum / Hard / Soft / Proximity |
Control Mode | Manual / Semiauto / Joystick |
Microscope | Dual CCD Zoom Motorize Microscope |
Option | Anti-vibration table CCD BSA |
F-200
Equipment | F-200 |
---|---|
Type | Touch PC Control & Joystick Semi-auto system |
Mask Size | up to 9”×9” |
Substrate Size | 8” |
Stage | X, Y, X, θ Motorize control |
Lamp & Power supply | 1000W |
Wave Length | 350~450nm |
UV Intensity | 15~25㎽/㎠ |
UV Beam Uniformity | 3~5% |
Resolution | 1um |
Alignment accuracy | 1um |
Contact Mode | Vacuum / Hard / Soft / Proximity |
Control Mode | Full Auto |
Microscope | Dual CCD Zoom Microscope |
Option | Anti-vibration table CCD BSA |
S-300
Equipment | S-300 |
---|---|
Type | Touch PC Control & Joystick Semi-auto system |
Mask Size | up to 7”×7”~14”×14” |
Substrate Size | Piece to 6’~12” |
Stage | X, Y, X, θ Motorize control |
Lamp & Power supply | 350W ~ 2000W |
Wave Length | 350~450nm |
UV Intensity | 15~25㎽/㎠ |
UV Beam Uniformity | 3~5% |
Resolution | 1um |
Alignment accuracy | 1um |
Contact Mode | Vacuum / Hard / Soft / Proximity |
Control Mode | Manual / Semiauto / Joystick |
Microscope | Dual CCD Zoom Motorize Microscope |
Option | Anti-vibration table CCD BSA |
M-500
Equipment | M-500 |
---|---|
Type | PLC Touch Control system |
Mask Size | 500mm×500mm 이상 |
Substrate Size | 370mm×470mm |
Resolution | 10㎛ |
Lamp & Power supply | 5000W |
Wave Length | 350~450nm |
UV Intensity | 15~20㎽/㎠ |
UV Beam Uniformity | 5~7% |
Contact Mode | Vacuum / Hard / Soft / Proximity |
Microscope | Dual CCD Zoom Microscope |
Option | X,Y,X,θ Motorizing Scope Motorizing |
T-700
Equipment | T-700 |
---|---|
Beam Size | Up to 800 mm×800 mm |
Resolution | Less Than 10㎛ [@PR] in Proximity |
Alignment Accuracy | Less Than ± 5.0 ㎛ |
Alignment | Semi Auto / Auto |
Substrate Size | 700 mm×700 mm |
Lamp Power | 8 kW NUV |
Wave Length | 365 nm |
UV Intensity | 20 mW/cm2 |
UV Beam Uniformity | Less Than ± 5 % [700 mm×700 mm] |
Contact Mode | Hard/Soft and Proximity |
Chuck Incremental Z-Motion | Accuracy 1 ㎛ |
Microscope | Dual Motorizing Zoom Microscope |
Operation System | Auto, Semi Auto |
L-100
Equipment | L-100 |
---|---|
Type | PLC Control Manual system |
Mask Size | Max 7”×7” |
Substrate Size | Piece to 6” |
Resolution | 1㎛ |
Alignment Accuracy | 1㎛ |
UV Lamp & Power | UV LED & POWER SUPPLY |
Wave Length | 365nm |
UV Intensity | ~40㎽/㎠ |
UV Beam Uniformity | 3~5% |
Contact Mode | Vacuum / Hard / Soft / Proximity |
Microscope | Dual CCD Zoom Microscope |
Option | nti-vibration table IR BSA,CCD BSA |